ibss Group, Inc.

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Surfaces redefined

Featured Product

GV10x UHV Downstream Asher

Competitive sources discovered by internet search may be HV but not UHV compatible. Vacuum components necessary to convert HV plasma sources UHV compatible require an expensive isolation valve and pre-pump components. 

The GV10x UHV DS Asher is designed to reside on a UHV chamber after chamber plasma cleaning in millitorr range without breaking vacuum. This one of a kind in-situ plasma source eliminates the need for a costly isolation valve and pre-pump.

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GV10x UHV DownStream Asher

Products

SEM, FIB and TEM Contamination Solutions

GV10x DS Asher

In-situ contamination mitigation is 10 times more efficient than other methods

GV/GA

User-assembled ex-situ bench top for EM samples, TEM holder cleaning and storage

Mobile DS Asher

MCA

Mobile downstream plasma center for ex-situ EM specimen and in-situ SEM/FIB chamber cleaning

Chiaro

Plasma clean & hydrophilisize surfaces, view TEM specimens, leak check fluid cells at 40X

Applications

The GV10x Downstream Asher’s ability to remove contamination from Electron Microscopy samples and chambers is well recognized by electron microscopists worldwide. Contamination control improvements beyond traditional methods: 1st generation plasma cleaners, LN2 trapping, UV exposure offer EM researches freedom to remove carbon artifacts in minutes and mitigate chamber contamination buildup.

A must for our lab

My [colleague] was so excited about your GV10x DS Asher that he insisted I had to buy one for my lab.

Northwestern University
Articles

In Situ Plasma Mirror Cleaning Report

An extended study on an advanced method for the cleaning of carbon contaminations from large optical surfaces using a remote inductively coupled low-pressure RF plasma source (GV10x DownStream Asher) is reported. Technical and scientific features of this scaled up cleaning process are analysed, such as the cleaning efficiency for different carbon allotropes (amorphous and diamond-like….  more…

Remote Plasma Cleaning of Optical Surfaces

Characterization, optimization and surface physics aspects of in situ plasma mirror cleaning Although the graphitic carbon contamination of synchrotron beamline optics has been an obvious problem for several decades, the basic mechanisms underlying the contamination process as well as the cleaning/remediation strategies are not understood and the corresponding cleaning procedures are still….  more…

Downstream Plasma Technology for TEM Report

Downstream Plasma Technology for Cleaning TEM Samples on Carbon Films Plasma cleaning has become an essential step in modern analytical electron microscopy, which requires contamination-free samples for imaging and elemental analysis. However, the dilemma for carbon film TEM grid users is how to plasma-clean the hydrocarbon contamination while preserving the carbon support film. In order….  more…

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Mobile DS Asher
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Mobile DS Asher
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GV10x

The GV10x Downstream Asher’s ability to remove carbon contamination is a major advancement above traditional methods of mitigating contamination using cold trapping, nitrogen purging, and other plasma cleaners. The GV10x, with its extended power and pressure range (5 to 100 Watts and 2 to <0.005 Torr), represents a paradigm shift in the carbon HC control in SEMs and other analytical instruments including Mas Spec, XPS etc.

As nanoscience progresses, electron probe analysis becomes more challenging: electron beam energies decrease, precursor gas use increases and maintaining high resolution becomes more dependent on maintaining low carbon and HC contamination levels. Downstream plasma process accomplishes eliminating hydrocarbon contamination accumulation and specimen cleaning simultaneously quickly, and easily. Unlike kinetic cleaning in usual ‘plasma cleaners’, the downstream plasma process is a gentle chemical (virtually zero K.E.) process. This process has revolutionized the means to eliminate carbon and hydrocarbons in vacuum chambers.

GV10x - UHV

The GV10x UHV DS Asher is designed to reside on an Ultra High Vacuum (UHV) chamber after chamber plasma cleaning in millitorr range without breaking vacuum. This one of a kind in-situ plasma source eliminates the need for other costly components in Ultra High Vacuum chamber configurations, including the need for isolation valve and pre-pump.

There are significant considerations needed to be evaluated for UHV systems and normal HV plasma cleaners generally do not meet the high standards needed:  GV10x-UHV soundly meets the requirements.
GV10X Controller & Source

MCA

A mobile plasma center that cleans, stores and processes SEM/TEM samples/holders and other sundry items in a small chamber. The Qwk-Switch™ Source facilitates shifting hydrocarbon mitigation to other SEM or FIB sites for in-situ chamber cleaning.

The MCA chamber accommodates an assortment of specimens to remove hydrocarbons, hydrophilizing surfaces, storing and cleaning three TEM holders and specimens with ibss signature GV10x Downstream plasma fitted onto a portable S/S cart.

Chiaro

The Chiaro similar to MCA but distinguished by turbomolecular pressure & speed. An optional optical microscope can be installed to mount and observe specimens during plasma conditioning and potential leak observation from liquid/gas specimen cells. Plasma processing at lower vacuum increases plasma processing activity. To meet requirements of viewing gas and liquid sample cells in TEM holders the Chiaro performs the functions of leak checking, gas/liquid E-Chip viewing while mounting, surface hydrophilization and plasma processing.

  • Easy TEM specimen loading through swing away chamber port
  • Swing away stereo mic with keyed re-registration
  • 5X mag w/6” working distance, LED illumination to view loading
  • Pressure monitor possible gas/liquid cell leaks at <2e-5 Torr
  • and much more..

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ibssGroup’s normal work hours are based on California time:  

8:00am to 6:00pm
Monday through Friday

Holiday Schedule

Martin Luther King Jr.:  January 15
Memorial Day:  May 27
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Labor Day: September 2
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