Upcoming Events

M&M 2024 – Microscopy & Microanalysis

ibssGroup is participating in the 2024 M&M conference with our latest technology and products.  Microscopy Society of America (MSA) is a collaborative community dedicated to

SPIE. Technology 2024

SPIE Photomask Technology + EUV Lithography 2024 is a global forum with two concurrent and tightly integrated conferences held in Monterey, California.   It is

ISTFA 2024

Golden Anniversary of the International Symposium for Testing and Failure Analysis, the premier event for the microelectronics failure analysis community. is the premier event for

Recent News

  • COVID-19 Update

    The ibss team is working diligently to maintain product shipping schedule and work within the coronavirus pandemic control parameters. ibss is making changes to ensure timely shipments and support by having some team members working remotely and office hours arranged to satisfy the shelter-in-place order.

    Read more

  • ACMM – Australia Feb 2020

    ibss Group is exhibiting at ACMM in Canberra, Australia – February 2020. We welcome local EM and TEM users to visit ibss booth during ACMM.  Please contact to schedule an on-site demo.

    Read more

  • Cells Alba speaker at SRI 2018

    Eric Pellegrin of Cells Alba, a ibss Group, Inc. partner, has been invited to present findings regarding GV10x performance on Synchrotrons at SRI 2018 in Taipei, Taiwan.  The Synchrotron Radiation Instrumentation (SRI 2018) will be hosted by

    Read more

  • Elminet Microanalysis Network

    ibss Group, Inc. local support in Japan

    Dear ibss Group Users,For support on ibss products in Japan please contact an authorized representative:Toshiyuki ShamotoElminet [email protected] you for your business.Sincerely,ibss Group, Inc.

    Read more

  • Shanghai Business Meeting

    On March 18, 2016 ibss Group conducted a sales meeting in Shanghai for its Asian representatives. Chinese companies in attendance were Beijing Python, Beijing United Cosmos, Hong Kong Guangdong, Jun Yi Tech, and Shanghai Risen. Focus Tek of Korea, Inte

    Read more


Newest Research: Remote Plasma Cleaning of Optical Surfaces

An extended study on an advanced method for the cleaning of carbon contaminations from large optical surfaces using a remote inductively coupled low-pressure RF plasma source (GV10x DownStream Asher) is reported. Technical and scientific features of th

GV10x Report

Downstream Asher for In-Situ Specimen and Specimen Chamber Cleaning presentation, showing before/after cleaning images and adjacent area scans. The ibss GV10x cleaner removed nearly all contamination build-up from the wafer surface after a total clean

In Situ Plasma Mirror Cleaning Report

Characterization, optimization and surface physics aspects of in situ plasma mirror cleaning Although the graphitic carbon contamination of synchrotron beamline optics has been an obvious problem for several decades, the basic mechanisms underlying the

Downstream Plasma Technology for TEM Report

Downstream Plasma Technology for Cleaning TEM Samples on Carbon Films Plasma cleaning has become an essential step in modern analytical electron microscopy, which requires contamination-free samples for imaging and elemental analysis. However, the dile


Work & Holiday Schedule

Normal Hours

ibssGroup’s normal work hours are based on California time:  

8:00am to 6:00pm
Monday through Friday

Holiday Schedule

Martin Luther King Jr.:  January 15
Memorial Day:  May 27
US Independence: July 4
Labor Day: September 2
US Thanksgiving: November 28 – 29
Winter Break:  December 24 thru January 2