Upcoming Events

Conference on Microscopy and Microanalysis
Canberra, Australia
February 16 – 20, 2020
SPIE Advanced Lithography 2020
San Jose, CA, USA
February 23 – 27, 2020
Microscopy & Microanalysis 2020
Milwaukee, Wisconsin, USA
Aug 2-6, 2020

Recent News

  • ACMM – Australia Feb 2020

    ibss Group is exhibiting at ACMM in Canberra, Australia – February 2020. We welcome local EM and TEM users to visit ibss booth during ACMM.  Please contact to schedule an on-site demo.

  • Cells Alba speaker at SRI 2018

    Eric Pellegrin of Cells Alba, a ibss Group, Inc. partner, has been invited to present findings regarding GV10x performance on Synchrotrons at SRI 2018 in Taipei, Taiwan.  The Synchrotron Radiation Instrumentation (SRI 2018) will be hosted by

  • Elminet Microanalysis Network

    ibss Group, Inc. local support in Japan

    Dear ibss Group Users, For support on ibss products in Japan please contact an authorized representative: • Toshiyuki Shamoto Elminet Corporation CDSEM and other frontend semiconductor associated applications • Hidehito Ochiai P

  • Shanghai Business Meeting

    On March 18, 2016 ibss Group conducted a sales meeting in Shanghai for its Asian representatives. Chinese companies in attendance were Beijing Python, Beijing United Cosmos, Hong Kong Guangdong, Jun Yi Tech, and Shanghai Risen. Focus Tek of Korea, Inte

  • ibss GV10x Demonstrations at Kammrath & Weiss

    ibss Group is pleased to announce that its partner, Kammrath & Weiss, will offer GV10x DS Asher Demonstrations in their Dortmund lab. Located in Dortmund, Germany, Kammrath & Weiss has over thirty years’ experience converting customer applicati


Newest Research: Remote Plasma Cleaning of Optical Surfaces

An extended study on an advanced method for the cleaning of carbon contaminations from large optical surfaces using a remote inductively coupled low-pressure RF plasma source (GV10x DownStream Asher) is reported. Technical and scientific features of th

GV10x Report

Downstream Asher for In-Situ Specimen and Specimen Chamber Cleaning presentation, showing before/after cleaning images and adjacent area scans. The ibss GV10x cleaner removed nearly all contamination build-up from the wafer surface after a total clean

In Situ Plasma Mirror Cleaning Report

Characterization, optimization and surface physics aspects of in situ plasma mirror cleaning Although the graphitic carbon contamination of synchrotron beamline optics has been an obvious problem for several decades, the basic mechanisms underlying the

Downstream Plasma Technology for TEM Report

Downstream Plasma Technology for Cleaning TEM Samples on Carbon Films Plasma cleaning has become an essential step in modern analytical electron microscopy, which requires contamination-free samples for imaging and elemental analysis. However, the dile