Conferences and Exhibitions
Upcoming Events
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SPIE. Technology 2024
Monterey, CA, USA
September 29 - October 3, 2024SPIE Photomask Technology + EUV Lithography 2024 is a global forum with two concurrent and tightly integrated conferences held in Monterey, California. It is an excellent opportunity for scientists, engineers, and industry leaders to meet, present and discuss results, challenges, and potential solutions in optical and EUV masks and lithography.
Photomask Technology, formerly known as BACUS, stands as a distinguished forum where professionals and academics from the semiconductor industry and related organizations come together to present and discuss the latest advancements in photomask technology. The event covers a wide range of topics, including materials, design, fabrication, quality control, and wafer imaging characterization in EUV, DUV, and other related technology areas.
The International Conference on Extreme Ultraviolet Lithography provides a forum to discuss and assess the worldwide status of EUV Lithography technology and associated infrastructure readiness. Scientists, engineers, and industry leaders meet to present and discuss new and unpublished materials, addressing the main challenges associated with the extendibility of the technology to smaller dimensions.
ibssGroup will be at the conference with the latest in the GV10x product line. Discuss your particular needs and see how ibssGroup may help in your goals of improving quality, efficiency, and saving time during processes. -
ISTFA 2024 - International Symposium
Hilton San Diego Bayfront, One Park Boulevard, San Diego, California
October 28 - November 1, 2024Golden Anniversary of the International Symposium for Testing and Failure Analysis, the premier event for the microelectronics failure analysis community. is the premier event for microelectronics failure analysis. Artificial Intelligence (AI) is revolutionarily changing the world, and profoundly reshaping the semiconductor industry. AI has been integrated into design, manufacture, process optimization, quality, reliability, and failure analysis (FA). Embracing and effectively using AI in Fault isolation (FI) and FA becomes crucial for new technology development and high-volume mass production. Visit ibssGroup at the conference to learn how GV10x innovative products can significantly improve reliability, quality, and improve robustness in manufacturing.
Past Events
The 49th International Symposium for Testing and Failure Analysis (ISTFA) is the premier event for microelectronics failure analysis. The focus on moving toward developing efficient and reliable power electronic devices for high-performing hardware components. The complexity of highly integrated SiC and GaN devices requires an in-depth understanding of defect formation and degradation mechanisms as well as adapted failure analysis methodologies. Visit ibssGroup at the conference to learn how GV10x innovative products can improve reliability and and improve robustness in manufacturing.
Photomask Technology, presented by the BACUS technical group of SPIE, provides a forum for the industry and academics to present and discuss photomask design, fabrication, quality control, and applications in semiconductor manufacturing and adjacent industries. Its co-location with the EUV Lithography Symposium in a single setting presents a unique opportunity to meet and share results, challenges, and potential solutions in both the EUV and DUV worlds.
Known as the Olympics of Microscopy, the International Microscopy Congress (IMC) is held every four years and attracts thousands of delegates from around the globe. The 20th IMC – IMC20 – is no exception. The world’s largest scientific program in microscopy, and showcase the latest in cutting-edge research. ibssGroup will be attending and discussing the latest advances in the GV10x product line that provides the fastest, safest, and most efficient plasma cleaner on the market.
ibssGroup is participating in the 2023 M&M conference with our latest technology and products. Microscopy Society of America (MSA) is a collaborative community dedicated to fostering research, innovation, advancement, and promotion of microscopy. The conference will provide a forum for the presentation and discussion of a wide range of microscopy and microanalysis techniques and their application to the biological and physical sciences.
Join us as we celebrate 50 years of service to the materials research community at the 2023 MRS Spring Meeting & Exhibit in person and online this April. For half a century, MRS has proudly represented the interests of thousands of materials researchers across disciplines, generations and continents. In collaboration with our global Membership, we have forged an unparalleled legacy of innovation at the leading edge of materials research and look forward to building on our momentum as we continue to invest in our field for years to come.
Mark your calendar and Save the Date for the premier microscopy education and networking event of the year — Microscopy & Microanalysis 2020, August 2-6, in Milwaukee, Wisconsin!
Time and time again, "multidisciplinary" research is touted as essential to innovation. That is why, from April 13-17, 2020, researchers working in seemingly unrelated fields will gather in Phoenix, Arizona, to promote, share and discuss issues and developments across disciplines.
The 2020 MRS Spring Meeting & Exhibit is the key forum to present research to an interdisciplinary and international audience. It provides a window on the future of materials science, and offers an opportunity for researchers—from students and postdoctoral fellows, to Nobel and Kavli Prize Laureates—to exchange technical information and network with colleagues.
Global Lithography Event, with topics including:
• Extreme Ultraviolet (EUV) Lithography
• Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS
• Metrology, Inspection, and Process Control for Microlithography
• Advances in Patterning Materials and Processes
• Optical Microlithography
• Design-Process-Technology Co-optimization for Manufacturability
• Advanced Etch Technology for Nanopatterning