GV10x UHV DS Asher
Competitive sources discovered by internet search may be High Vacuum (HV) but not Ultra-High Vacuum (UHV) compatible. Vacuum components necessary to convert HV plasma sources UHV compatible require an expensive isolation valve and pre-pump components.
The GV10x UHV DS Asher is designed to reside on a UHV chamber after chamber plasma cleaning in millitorr range without breaking vacuum. This one of a kind in-situ plasma source eliminates the need for a costly isolation valve and pre-pump.
Key Features
- Cleaning Cycle in Minutes; 10X Faster than Competitive Units
- Offers Superior Performance over ‘Classical’ Capacitive Antenna Source
- O2/Ar O0 Plasma for Non-Oxidizing Surfaces
- H2/Ar/Ne H0 Plasma for Ni and Rh oxidizing layers
- Grating Efficiency Increased by factor of 7.6
- Full Recovery of Blazed High Energy Grating Profile
- Continuously Adjustable Operating Pressure of <5 mTorr to 2 Torr
- Extended Power Range: 5-100 Watts RF Power
- Non-Damaging
- System PC Protected by Opto-Isolation in both Controllers
- Very High Cleaning Efficiency and Uniformity
- Reduces Contamination 10X to 20X more Effectively than Competitive Units
- Cleaning Cycle in Minutes; 10X Faster than Competitive Units
- Future Upscaling and H0 Contamination Removal Improvements Underway
