The GV10x Downstream Asher’s ability to remove carbon contamination is a major advancement over traditional methods of mitigating contamination using cold trapping, nitrogen purging, and other plasma cleaners. The GV10x, with its extended power and pressure range (5 to 100 Watts and 2 to <0.005 Torr), represents a paradigm shift in the carbon decontamination of SEMs and other vacuum systems. Atomic oxygen and hydrogen eliminates contamination by converting the surface carbon into gas phase molecules which are then pumped out of chambers.

ibss Group, Inc. offers two different controllers to power and operate GV10x plasma sources. The choice between BT Controller and 2U Controller is a laboratory user preference. The ibss GUI software is compatible with both controllers.

Competitive sources discovered by internet search may be High Vacuum (HV) but not Ultra-High Vacuum (UHV) compatible. Vacuum components necessary to convert HV plasma sources UHV compatible require an expensive isolation valve and pre-pump components.

The GV10x UHV DS Asher is designed to reside on a UHV chamber after chamber plasma cleaning in millitorr range without breaking vacuum. This one of a kind in-situ plasma source eliminates the need for a costly isolation valve and pre-pump.

Through an innovative plasma source design, the GV10x UHV Downstream Asher reduces hydrocarbon contamination 10 to 20 times more effectively on synchrotron optics and >10 times faster than traditional methods and plasma cleaners.

A mobile plasma center that cleans, stores and processes SEM/TEM samples/holders and other sundry items in a small chamber. The Qwk-Switch™ Source facilitates shifting hydrocarbon mitigation to other SEM or FIB sites for in-situ chamber cleaning.

The MCA chamber accommodates an assortment of specimens to remove hydrocarbons, hydrophilizing surfaces, storing and cleaning three TEM holders and specimens with ibss signature GV10x Downstream plasma fitted onto a portable S/S cart.

Similar to MCA but distinguished by turbomolecular pressure & speed. An optional optical microscope can be installed to mount and observe specimens during plasma conditioning and potential leak observation from liquid/gas specimen cells. Plasma processing at lower vacuum increases plasma processing activity. To meet requirements of viewing gas and liquid sample cells in TEM holders the Chiaro performs the functions of leak checking, gas/liquid E-Chip viewing while mounting, surface hydrophilization and plasma processing.