GV10x DS Asher

GV10x DS Asher


ibss Group, Inc. offers two different controllers to power and operate GV10x plasma sources. The choice between BT Controller and 2U Controller is a laboratory user preference. The ibss GUI software is compatible with both controllers.

Benchtop (BT):
1. Compatible with GV10x GUI software (Windows OS)
2. Included push buttons panel on the BT for operating when GUI installation is not an option
3. Must be reachable if NOT operating with GUI

2U:
1. Compatible with GV10x GUI software (Windows OS)
2. No push button panel on the 2U, MUST operate from Windows PC/Tablet
3. Standard rackmount size
4. Smaller footprint, can be placed against user’s computer tower under the desk.

The GV10x Downstream Asher’s ability to remove carbon contamination is a quantum leap beyond the traditional methods of mitigating contamination using cold trapping, nitrogen purging, and other plasma cleaners. The GV10x, with its extended power and pressure range (5 to 100 Watts and 2 to <0.005 Torr), represents a paradigm shift in the carbon decontamination of SEMs and other vacuum systems.
Atomic oxygen and hydrogen eliminate contamination by converting the surface carbon into gas phase molecules which are then pumped out of chambers, not just immobilized on trapping surfaces. Sample artifacts such as polymerized deposits are minimized by low carbon levels in SEM chambers.

Since cleaning periods will vary between instruments, the GV10x DS Asher can be used on several laboratory tools by moving the GV10x Source from instrument to instrument. Relocation of the GV10x DS Asher can be facilitated by placing an isolation valve between the GV10x Source and the instrument vacuum chamber, as seen on the S-4700 FESEM.

As nanoscience progresses, electron beams become more tightly focused, electron beam energies decrease, and precursor gas use increases, high resolution will become increasingly more dependent on keeping carbon contamination at low levels. De-contamination and anti-contamination by a remote or downstream plasma process accomplishes this task quickly, easily, and in a cost-effective way. Unlike kinetic sputter etch cleaning in usual 'plasma cleaners', the downstream plasma process is a gentle chemical etch. The process has revolutionized the means to eliminate carbon molecules and hydrocarbons in vacuum chambers.

Well suited for large volume chambers and heavily contaminated surfaces, the GV10x DS Asher takes less time to achieve pristinely cleaned chambers, since it develops higher atomic oxygen and hydrogen concentrations to remove contamination with the same delicate result but in less time. Customers say that "…using the GV10x, we can achieve efficient and uniform hydrocarbon control throughout large chambers in 1/10 of the time and with more uniformity than with established methods."

Key Features

  • Inductively Coupled
  • Continuously Adjustable Operating Pressure of <5 mTorr to 2 Torr
  • Extended Power Range: 5-100 Watts RF Power
  • Very High Cleaning Efficiency and Uniformity
  • Reduces Contamination 10X to 20X more Effectively than Competitive Units
  • Removal Rate is Repeatable; at 30 Watts, rate is 1.5 nm/min
  • Non-Damaging
  • Full operation with TMP on
  • Cleaning Cycle in Minutes; 10X Faster than Competitive Units
  • Source Easily Moved from Instrument to Instrument
  • No Heating, Sputtering, or Etching
  • Runs with no Interruption of System Interlock Software
  • Microscopes Protected by Opto-Isolation in both Controllers
  • Return on Investment Short as Six Month

  • Made in USA  Made in USA

  • GV10x DS Asher on Hitachi S-4700 SEM