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GV10x特高压顺流清洗器

通过网络搜索找到的竞争产品可能是高压产品,但不特高压产品。 将高压等离子体源转换为与特高压兼容的真空元件需要昂贵的隔离阀和预泵组件。 

GV10x超高压顺流清洗器用于特高压室,在毫托尔范围内进行腔室的等离子清洗后不会破坏真空状态。 这种原位等离子体源不需要昂贵的隔离阀和预泵。

GV10x UHV DownStream Asher

扫描电镜、聚焦离子束显微镜、透射电镜防污染解决方案

GV10x 顺流等离子清洗器

原位去污染的效果比传统方法高10倍以上

GV10x Source

GV10x UHV Asher

Ultra-High Vacuum compatible. - components necessary to convert HV plasma sources UHV compatible

MCA

移动式顺流等离子清洗中心,用于非原位电镜样品和原位的扫描电镜(SEM)/聚焦离子束(FIB)显微镜腔的清洗

Chiaro - Complete solution in rolling cabinet

Chiaro

等离子清洗和亲水表面,检测TEM样品,放大40倍下液体检漏

全世界的电子显微镜学家一致认同GV10x 等离子清洗器能够温和有效地去除电子显微镜样品和腔室中的碳污染。 比起传统方法,它在污染控制中取得了长足的进步:第1代等离子清洗器可吸附液氮和净化氮气,在短短几分钟内清除碳污染,减轻电子显微镜腔内的污染物聚集。.

一项扩展研究深入调查了使用远程感应耦合低压射频等离子体源(GV10x顺流清洗器)从大面积光镜表面去除碳污染的这一先进清洗方法。 研究分析了这种放大清洗工艺的技术和科学特点,如不同碳同素异形体(非晶和类金刚石)的清洗效率…… 更多……

原位等离子体镜清洗的表征、优化和表面物理特征。尽管几十年来,同步辐射光束线光镜的石墨碳污染一直是一个公认的难题,污染过程的基本机制以及清洁/补救策略尚未明确,相应的清洁程序仍然…… 更多……

用于清洁碳膜上TEM样品的下游等离子体技术 等离子体清洗已成为现代分析电子显微镜中必不可少的一步,这需要无污染样品进行成像和元素分析。 然而,碳膜透射电镜网格用户面临的难题是如何在保持碳支撑膜的同时用等离子清除碳氢化合物的污染。 为了……  更多……

ibss集团 全球代表机会

GV10X Controller & Source
GV10x DS 灰化器系列

扩大ibss集团在全球的销售

ibss Group, Inc. 等离子体产品在电子显微镜和其他分析仪器室中实现了低碳氢化合物水平,是全球公认的。 有机和无机样品在原位或异地有效且高效地无污染。

为了满足全球半导体需求,专注于低温生物学研究,我们积极接受销售代理的咨询,并提供相关产品组合,通过服务支持推动销售。

新的销售代理将扩大现有的销售渠道。

全球销售代表

  • 这个字段是用于验证目的,应该保持不变。

The GV10x Downstream Asher’s ability to remove carbon contamination is a major advancement above traditional methods of mitigating contamination using cold trapping, nitrogen purging, and other plasma cleaners. The GV10x, with its extended power and pressure range (5 to 100 Watts and 2 to <0.005 Torr), represents a paradigm shift in the carbon HC control in SEMs and other analytical instruments including Mas Spec, XPS etc.

As nanoscience progresses, electron probe analysis becomes more challenging: electron beam energies decrease, precursor gas use increases and maintaining high resolution becomes more dependent on maintaining low carbon and HC contamination levels. Downstream plasma process accomplishes eliminating hydrocarbon contamination accumulation and specimen cleaning simultaneously quickly, and easily. Unlike kinetic cleaning in usual ‘plasma cleaners’, the downstream plasma process is a gentle chemical (virtually zero K.E.) process. This process has revolutionized the means to eliminate carbon and hydrocarbons in vacuum chambers.

The GV10x UHV DS Asher is designed to reside on an Ultra High Vacuum (UHV) chamber after chamber plasma cleaning in millitorr range without breaking vacuum. This one of a kind in-situ plasma source eliminates the need for other costly components in Ultra High Vacuum chamber configurations, including the need for isolation valve and pre-pump.

There are significant considerations needed to be evaluated for UHV systems and normal HV plasma cleaners generally do not meet the high standards needed:  GV10x-UHV soundly meets the requirements.

MCA

A mobile plasma center that cleans, stores and processes SEM/TEM samples/holders and other sundry items in a small chamber. The Qwk-Switch™ Source facilitates shifting hydrocarbon mitigation to other SEM or FIB sites for in-situ chamber cleaning.

The MCA chamber accommodates an assortment of specimens to remove hydrocarbons, hydrophilizing surfaces, storing and cleaning three TEM holders and specimens with ibss signature GV10x Downstream plasma fitted onto a portable S/S cart.

The Chiaro similar to MCA but distinguished by turbomolecular pressure & speed. An optional optical microscope can be installed to mount and observe specimens during plasma conditioning and potential leak observation from liquid/gas specimen cells. Plasma processing at lower vacuum increases plasma processing activity. To meet requirements of viewing gas and liquid sample cells in TEM holders the Chiaro performs the functions of leak checking, gas/liquid E-Chip viewing while mounting, surface hydrophilization and plasma processing.

  • Easy TEM specimen loading through swing away chamber port
  • Swing away stereo mic with keyed re-registration
  • 5X mag w/6” working distance, LED illumination to view loading
  • Pressure monitor possible gas/liquid cell leaks at <2e-5 Torr
  • and much more..

Work & Holiday Schedule

Normal Hours

ibssGroup’s normal work hours are based on California time:  

8:00am to 6:00pm
Monday through Friday

Holiday Schedule

Martin Luther King Jr.:  January 15
Memorial Day:  May 27
US Independence: July 4
Labor Day: September 2
US Thanksgiving: November 28 – 29
Winter Break:  December 24 thru January 2

与使用冷凝捕集器、氮气吹尘和其他等离子清洁器去污染的传统方法相比,GV10x等离子清洗器清除碳污染的能力得到了重大的改善。 GV10x具有更大的功率和压力范围(5到100瓦,2到<0.005 Torr),代表了SEM和其他分析仪器(包括Mas-Spec、XPS等)中碳和碳氢化合物控制达到了典范式的转变。

随着纳米科学的发展,电子探针分析变得越来越具有挑战性:电子束能量降低,反应气体使用的增加,保持高分辨率越来越依赖于保持低碳污染状态和低HC污染水平。 顺流等离子工艺可以快速、方便地消除碳氢化合物的污染并进行样品清洗。 与传统的“等离子清洗器”中的动能清洗不同,顺流等离子清洗过程是一个温和的化学过程(无动力冲击)。 这一过程彻底地改变了清除真空腔中碳和碳氢化污染的方法。

Gentle Asher™的设计旨在扩大GV10x的应用,用以清洗放入电子显微镜腔体前的样品。 Gentle Asher™腔体与GV10x结合,可以极大地防止黑色扫描方框的生成。

By simply shifting the GVx Source onto the Gentle Asher Chamber, this technique easily and effectively removes impurities from samples and TEM holders without causing any considerable damage and at the same time controls hydrocarbon levels in SEM, TEM, CDSEM and FIB. When samples and holders are pre-cleaned, it prevents contamination of the chamber gas phase and reduces the time involved in microscope cleanings.

MCA

移动式等离子清洗中心,配置小型长方腔室,可清洗、储存和处理SEM/TEM样品/支架和其他杂物。 Qwk-Switch™快速接头将碳氢污染转移到其他SEM或FIB以进行原位镜腔清洁。

MCA腔室可容纳需要去除碳氢污染的样品,亲水表面可储存和清洁三个TEM样品杆,带有ibss签名的GV10x顺流等离子清洗器安装在便携式的不锈钢推车上。

虽然与MCA类似,但Chiaro的涡轮分子压力和速度是有所不同的。 配置可安装的光学显微镜,以便在等离子处理期间观察样品,并在液体/气体样品中检测是否存在泄漏现象。 在低真空处理等离子可增加等离子的活性。 为了检测TEM杆中气体和液体样品是否存在泄露现象,Chiaro具备了检漏功能,不仅在安装时可观察气体/液体的电子晶片,还可测试表面的亲水度并处理等离子。

  • Easy TEM specimen loading through swing away chamber port
  • Swing away stereo mic with keyed re-registration
  • 5X mag w/6” working distance, LED illumination to view loading
  • Pressure monitor possible gas/liquid cell leaks at <2e-5 Torr
  • and much more..

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