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主打产品

GV10x特高压顺流清洗器

通过网络搜索找到的竞争产品可能是高压产品,但不特高压产品。 将高压等离子体源转换为与特高压兼容的真空元件需要昂贵的隔离阀和预泵组件。

GV10x超高压顺流清洗器用于特高压室,在毫托尔范围内进行腔室的等离子清洗后不会破坏真空状态。 这种原位等离子体源不需要昂贵的隔离阀和预泵。

GV10x UHV DownStream Asher

扫描电镜、聚焦离子束显微镜、透射电镜防污染解决方案

GV10x 顺流等离子清洗器

原位去污染的效果比传统方法高10倍以上

GV/GA

用户组装的非原位台式机,用于电镜(EM)样品,透射电子显微镜(TEM)试片杆的清洗和储藏

Mobile DS Asher

MCA

移动式顺流等离子清洗中心,用于非原位电镜样品和原位的扫描电镜(SEM)/聚焦离子束(FIB)显微镜腔的清洗

Chiaro

等离子清洗和亲水表面,检测TEM样品,放大40倍下液体检漏

全世界的电子显微镜学家一致认同GV10x 等离子清洗器能够温和有效地去除电子显微镜样品和腔室中的碳污染。 比起传统方法,它在污染控制中取得了长足的进步:第1代等离子清洗器可吸附液氮和净化氮气,在短短几分钟内清除碳污染,减轻电子显微镜腔内的污染物聚集。.

With cleaning processes that provide the most through cleaning in a tenth of the time of other processes we considered. Leadership in plazma cleaning and forging new approaches for CDSEM and syncrotron applications.

一项扩展研究深入调查了使用远程感应耦合低压射频等离子体源(GV10x顺流清洗器)从大面积光镜表面去除碳污染的这一先进清洗方法。 研究分析了这种放大清洗工艺的技术和科学特点,如不同碳同素异形体(非晶和类金刚石)的清洗效率…… 更多……

原位等离子体镜清洗的表征、优化和表面物理特征。尽管几十年来,同步辐射光束线光镜的石墨碳污染一直是一个公认的难题,污染过程的基本机制以及清洁/补救策略尚未明确,相应的清洁程序仍然…… 更多……

使用顺流等离子技术在碳膜等离子体上清洗透射电镜样品的技术已经成为现代分析电子显微术的一个重要步骤,它需要无污染的样品进行成像和元素分析。 然而,碳膜透射电镜网格用户面临的难题是如何在保持碳支撑膜的同时用等离子清除碳氢化合物的污染。 为了…… 更多……

全球销售代表

Ibss的产品和配件通过我们授权的销售代理在全球范围内供应。 公司及其代表承诺,在每个产品的使用期限内提供迅速快捷的产品支持。

North American Headquarters

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Burlingame, California

Canada

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Ottawa, Ontario

United States – Rep

Rave Scientific

Somerset, New Jersey

France

milexia
Verrières-le-Buisson

Poland

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Piaseczno

Italy

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Binasco MI

Germany

FIB-Logo3
Kassel

China Headquarters

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中国上海 上海自由贸易试验区

Japan

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Otsuka-cho, Miyazaki

Japan

Elminet Microanalysis Network
Tokyo

China

HK-Guanghong-International.sm
Shanghai

Australia

Thomson Scientific Instruments
Box Hill, Victoria

Korea

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Osan-si, Gyenggi-do

Malaysia

DA Fung Logo
Penang

Taiwan

International Business Solutions
Zhubei, Hsinchu

Turkey

Ataşehir, Istanbul
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Israel

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Kiryat Ata

Microscopy & Microanalysis 2020
Milwaukee, Wisconsin, USA
Aug 2-6, 2020

The GV10x Downstream Asher’s ability to remove carbon contamination is a major advancement above traditional methods of mitigating contamination using cold trapping, nitrogen purging, and other plasma cleaners. The GV10x, with its extended power and pressure range (5 to 100 Watts and 2 to <0.005 Torr), represents a paradigm shift in the carbon HC control in SEMs and other analytical instruments including Mas Spec, XPS etc.

As nanoscience progresses, electron probe analysis becomes more challenging: electron beam energies decrease, precursor gas use increases and maintaining high resolution becomes more dependent on maintaining low carbon and HC contamination levels. Downstream plasma process accomplishes eliminating hydrocarbon contamination accumulation and specimen cleaning simultaneously quickly, and easily. Unlike kinetic cleaning in usual ‘plasma cleaners’, the downstream plasma process is a gentle chemical (virtually zero K.E.) process. This process has revolutionized the means to eliminate carbon and hydrocarbons in vacuum chambers.

The Gentle Asher has been specifically designed to expand the GV10x investment for sample cleaning prior to inserting into the EM chamber. The Gentle Asher Chamber, which is integrated with a GV10x connected GA/GV, is ideal for preventing black scan square deposits.

By simply shifting the GVx Source onto the Gentle Asher Chamber, this technique easily and effectively removes impurities from samples and TEM holders without causing any considerable damage and at the same time controls hydrocarbon levels in SEM, TEM, CDSEM and FIB. When samples and holders are pre-cleaned, it prevents contamination of the chamber gas phase and reduces the time involved in microscope cleanings.

MCA

A mobile plasma center that cleans, stores and processes SEM/TEM samples/holders and other sundry items in a small chamber. The Qwk-Switch™ Source facilitates shifting hydrocarbon mitigation to other SEM or FIB sites for in-situ chamber cleaning.

The MCA chamber accommodates an assortment of specimens to remove hydrocarbons, hydrophilizing surfaces, storing and cleaning three TEM holders and specimens with ibss signature GV10x Downstream plasma fitted onto a portable S/S cart.

The Chiaro similar to MCA but distinguished by turbomolecular pressure & speed. An optional optical microscope can be installed to mount and observe specimens during plasma conditioning and potential leak observation from liquid/gas specimen cells. Plasma processing at lower vacuum increases plasma processing activity. To meet requirements of viewing gas and liquid sample cells in TEM holders the Chiaro performs the functions of leak checking, gas/liquid E-Chip viewing while mounting, surface hydrophilization and plasma processing.

  • Easy TEM specimen loading through swing away chamber port
  • Swing away stereo mic with keyed re-registration
  • 5X mag w/6” working distance, LED illumination to view loading
  • Pressure monitor possible gas/liquid cell leaks at <2e-5 Torr
  • and much more..