An extended study on an advanced method for the cleaning of carbon contaminations from large optical surfaces using a remote inductively coupled low-pressure RF plasma source (GV10x DownStream Asher) is reported. Technical and scientific features of this scaled up cleaning process are analysed, such as the cleaning efficiency for different carbon allotropes (amorphous and diamond-like

Downstream Asher for In-Situ Specimen and Specimen Chamber Cleaning presentation, showing before/after cleaning images and adjacent area scans. The ibss GV10x cleaner removed nearly all contamination build-up from the wafer surface after a total clean time of 13 minutes. Additionally: Further cleaning may have completely removed the contamination rectangle It was noted that the line-widths

Characterization, optimization and surface physics aspects of in situ plasma mirror cleaning Although the graphitic carbon contamination of synchrotron beamline optics has been an obvious problem for several decades, the basic mechanisms underlying the contamination process as well as the cleaning/remediation strategies are not understood and the corresponding cleaning procedures are still under development. In

Downstream Plasma Technology for Cleaning TEM Samples on Carbon Films Plasma cleaning has become an essential step in modern analytical electron microscopy, which requires contamination-free samples for imaging and elemental analysis. However, the dilemma for carbon film TEM grid users is how to plasma-clean the hydrocarbon contamination while preserving the carbon support film. In order