An extended study on an advanced method for the cleaning of carbon contaminations from large optical surfaces using a remote inductively coupled low-pressure RF plasma source (GV10x DownStream Asher) is reported. Technical and scientific features of th

Downstream Asher for In-Situ Specimen and Specimen Chamber Cleaning presentation, showing before/after cleaning images and adjacent area scans. The ibss GV10x cleaner removed nearly all contamination build-up from the wafer surface after a total clean

Characterization, optimization and surface physics aspects of in situ plasma mirror cleaning Although the graphitic carbon contamination of synchrotron beamline optics has been an obvious problem for several decades, the basic mechanisms underlying the

Downstream Plasma Technology for Cleaning TEM Samples on Carbon Films Plasma cleaning has become an essential step in modern analytical electron microscopy, which requires contamination-free samples for imaging and elemental analysis. However, the dile