October 1 – 5, 2023
Monterey, CA, USA

Photomask Technology, presented by the BACUS technical group of SPIE, provides a forum for the industry and academics to present and discuss photomask design, fabrication, quality control, and applications in semiconductor manufacturing and adjacent industries. Its co-location with the EUV Lithography Symposium in a single setting presents a unique opportunity to meet and share results, challenges, and potential solutions in both the EUV and DUV worlds. 


Work & Holiday Schedule

Normal Hours

ibssGroup’s normal work hours are based on California time:  

8:00am to 6:00pm
Monday through Friday

Holiday Schedule

Martin Luther King Jr.:  January 16
Memorial Day:  May 29
US Independence: July 4
Labor Day: September 5
US Thanksgiving: November 24 – 25
Winter Break:  December 24 thru January 3