Photomask Technology, presented by the BACUS technical group of SPIE, provides a forum for the industry and academics to present and discuss photomask design, fabrication, quality control, and applications in semiconductor manufacturing and adjacent industries. Its co-location with the EUV Lithography Symposium in a single setting presents a unique opportunity to meet and share results, challenges, and potential solutions in both the EUV and DUV worlds.
ibssGroup’s normal work hours are based on California time:
8:00am to 6:00pm
Monday through Friday
Martin Luther King Jr.: January 15
Memorial Day: May 27
US Independence: July 4
Labor Day: September 2
US Thanksgiving: November 28 – 29
Winter Break: December 24 thru January 2
We welcome your interest in ibss Group, Inc. products. In order to best respond to your questions and needs, please fill out our Event Contact form. We will be in contact as soon as possible.
Thank you,
ibss Group, Inc.
