News

Eric Pellegrin of Cells Alba, a ibss Group, Inc. partner, has been invited to present findings regarding GV10x performance on Synchrotrons at SRI 2018 in Taipei, Taiwan.  The Synchrotron Radiation Instrumentation (SRI 2018) will be hosted by the National Synchrotron Radiation Research Center (NSRRC) from June 10 to 15, 2018. A 5-day scientific program will feature the invited… Read more »

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Dear ibss Group Users, For support on ibss products in Japan please contact an authorized representative: • Toshiyuki Shamoto Elminet Corporation t.shamoto@elminet.co.jp CDSEM and other frontend semiconductor associated applications • Hidehito Ochiai Possible, Inc. ochiai-h@possible.co.jp Thank you for your business. Sincerely, ibss Group, Inc.

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On March 18, 2016 ibss Group conducted a sales meeting in Shanghai for its Asian representatives. Chinese companies in attendance were Beijing Python, Beijing United Cosmos, Hong Kong Guangdong, Jun Yi Tech, and Shanghai Risen. Focus Tek of Korea, International Business Solutions (IBS) of Taiwan, Da Fung Solution of Malaysia, and AD Science of Japan… Read more »

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An extended study on an advanced method for the cleaning of carbon contaminations from large optical surfaces using a remote inductively coupled low-pressure RF plasma source (GV10x DownStream Asher) is reported. Technical and scientific features of this scaled up cleaning process are analysed, such as the cleaning efficiency for different carbon allotropes (amorphous and diamond-like… Read more »

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ibss Group is pleased to announce that its partner, Kammrath & Weiss, will offer GV10x DS Asher Demonstrations in their Dortmund lab. Located in Dortmund, Germany, Kammrath & Weiss has over thirty years’ experience converting customer application requirements into useful products in the EM world. K&W’s developments are brought to life through high precision micro… Read more »

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ibss Group is pleased to introduce Scott Shen, its newly appointed bilingual Chinese Liaison. Scott Shen graduated UC Berkeley with a BS and MS in EECS. His employment history includes several Silicon Valley companies including HP, Knights, KLA-Tencor, FEI, Magma and Synopsys. He has been directly involved with several Asian companies as well: TSMC, UMC, Samsung, SMIC. Mr…. Read more »

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Downstream Asher for In-Situ Specimen and Specimen Chamber Cleaning presentation, showing before/after cleaning images and adjacent area scans. The ibss GV10x cleaner removed nearly all contamination build-up from the wafer surface after a total clean time of 13 minutes. Additionally: Further cleaning may have completely removed the contamination rectangle It was noted that the line-widths… Read more »

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Characterization, optimization and surface physics aspects of in situ plasma mirror cleaning Although the graphitic carbon contamination of synchrotron beamline optics has been an obvious problem for several decades, the basic mechanisms underlying the contamination process as well as the cleaning/remediation strategies are not understood and the corresponding cleaning procedures are still under development. In… Read more »

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Downstream Plasma Technology for Cleaning TEM Samples on Carbon Films Plasma cleaning has become an essential step in modern analytical electron microscopy, which requires contamination-free samples for imaging and elemental analysis. However, the dilemma for carbon film TEM grid users is how to plasma-clean the hydrocarbon contamination while preserving the carbon support film. In order… Read more »

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