The GV10x Downstream Asher’s ability to remove carbon contamination is a quantum leap beyond the traditional methods of mitigating contamination using cold trapping, nitrogen purging, and other plasma cleaners. The GV10x, with its extended power and pressure range (5 to 100 Watts and 2 to Atomic oxygen and hydrogen eliminates contamination by converting the surface carbon into gas phase molecules which are then pumped out of chambers – not just immobilized on trapping surfaces. Sample artifacts such as polymerized deposits are minimized by low carbon levels in SEM chambers.
Since cleaning periods will vary between instruments, the GV10x DS Asher can be used on several laboratory tools by moving the GV10x Source from instrument to instrument. Relocation of the GV10x DS Asher can be facilitated by placing an isolation valve between the GV10x Source and the instrument vacuum chamber, as seen on the S-4700 FESEM.
With the progression of nanoscience, electron beams become more tightly focused, electron beam energies decrease, and precursor gas use increases. High resolution will become increasingly more dependent on keeping carbon contamination at low levels. Decontamination and anti-contamination by remote or downstream plasma process accomplishes this task quickly, easily, and in a cost-effective way. Unlike kinetic sputter etch cleaning in usual ‘plasma cleaners’, the downstream plasma process is a gentle chemical etch. The process has revolutionized the means to eliminate carbon molecules and hydrocarbons in vacuum chambers.
Well suited for large volume chambers and heavily contaminated surfaces, the GV10x DS Asher takes less time to achieve pristinely cleaned chambers, since it develops higher atomic oxygen and hydrogen concentrations to remove contamination with the same delicate result but in less time. Customers say that using the GV10x, they can achieve efficient and uniform hydrocarbon control throughout large chambers in 1/10 of the time and with more uniformity than with established methods.