Turning Brilliant Ideas into Affordable Tools

More about ibss

Our products

The GV10x Downstream Asher reduces hydrocarbon contamination 10X to 20X more effectively and 10X faster than traditional methods. From in-situ electron beam instrument cleaning to hydrogen cleaning to ex-situ sample cleaning and storage, ibss Group offers GV10x options that meet your contamination needs.

View all Products

Applications

The GV10x Downstream Asher’s ability to remove carbon contamination is a quantum leap beyond the traditional methods of mitigating contamination using cold trapping, nitrogen purging, and other plasma cleaners. The GV10x, with its extended power and pressure range (5 to 100 Watts and 2 to <0.005 Torr), represents a paradigm shift in the carbon decontamination of SEMs and other vacuum systems.

Learn More About Applications

Upcoming Events

View all Events
  • Southern California Society for Microscopy and Microanalysis
    Southern California Society for Microscopy and Microanalysis Southern California
    TBD

    The SOUTHERN CALIFORNIA SOCIETY FOR MICROSCOPY & MICROANALYSIS is dedicated to increasing interest and information in all areas of microscopy and microanalysis, including, but not limited to: transmission electron, scanning electron and electron microprobe, ion probe, microbeam analysis, optical and confocal microscopies, and microspectroscopies.

    Event Page
  • MMC 2017
    MMC 2017 Manchester, UK
    July 3 - 6, 2017

    The Microscience Microscopy Congress is set to be as big and as bold as ever with six parallel conference sessions, an exhibition with more than 100 companies represented, and a brilliant selection of features such as pre-event workshops and turn-up-and-learn training opportunities.

    Event Page
  • M&M 2017
    M&M 2017 St. Louis, MO, USA
    August 6-10, 2017

    The Microscopy Society of America (MSA), the Microanalysis Society (MAS), and the International Field Emission Society (IFES) gather at the M&M 2017 Annual Meeting and Exhibition at the America’s Center Convention Complex

    Event Page
  • SPIE Photomask Technology 2016
    SPIE Photomask Technology 2016 Monterey, California
    September 11-14 2017

    Present and publish at SPIE Photomask Technology + Extreme Ultraviolet Lithography 2017, a technical meeting for mask makers, EUVL, emerging technologies, and the future of mask business.

    Event Page