The GV10x Downstream Asher reduces hydrocarbon contamination 10X to 20X more effectively and 10X faster than traditional methods. From in-situ electron beam instrument cleaning to hydrogen cleaning to ex-situ sample cleaning and storage, ibss Group offers GV10x options that meet your contamination needs.View all Products
The GV10x Downstream Asher’s ability to remove carbon contamination is a quantum leap beyond the traditional methods of mitigating contamination using cold trapping, nitrogen purging, and other plasma cleaners. The GV10x, with its extended power and pressure range (5 to 100 Watts and 2 to <0.005 Torr), represents a paradigm shift in the carbon decontamination of SEMs and other vacuum systems.Learn More About Applications
This article published in Microscopy Today January 2014 investigates sample cleaning with the GV10x coupled with the GA Chamber, The GV/GA.Read Research
This article published in The Journal of Synchrotron Radiation analyzes remediation strategies all based on in situ low-pressure RF plasma cleaning approaches, including a quantitative determination of the optimum process parameters and their influence on the chemistry as well as the morphology of optical test surfaces.Read Research
ibss Group is pleased to announce that its partner, Kammrath & Weiss, will offer GV10x Asher Demonstrations in their Dortmund lab.
Located in Dortmund, Germany, Kammrath & Weiss has over thirty years’ experience converting customer application requirements into useful products in the EM world. K&W’s developments are brought to life through high precision micro and nano systems, carefully designed in great detail with tomorrow’s needs in mind.Learn More
IPFA 2017 is organized by the IEEE Reliability / CPMT / ED Singapore Chapter, IEEE Electron Devices Society Chengdu Chapter and the University of Electronic Science and Technology of China ( UESTC ) . The Symposium is technically co-sponsored by the IEEE Electron Device Society and IEEE Reliability Society. IPFA 2017 will be devoted to the fundamental understanding of the physical mechanisms governing failure in a large variety of advanced semiconductor devices and the electrical - physical failure analysis techniques, methodologies and tools that could be use to reliably identify the root cause of failure in these devices.Event Page
The Microscopy Society of America (MSA), the Microanalysis Society (MAS), and the International Field Emission Society (IFES) gather at the M&M 2017 Annual Meeting and Exhibition at the America’s Center Convention ComplexEvent Page
Present and publish at SPIE Photomask Technology + Extreme Ultraviolet Lithography 2017, a technical meeting for mask makers, EUVL, emerging technologies, and the future of mask business.Event Page
43rd International Symposium for Testing and Failure Analysis (ISTFA)Event Page
"Cleaning rates were so high that depositions were removed faster than expected...it becomes obvious that the carbon cleaning in the case of the GV10x...is much more efficient."
-Cells Alba Synchrotron Light Facility
"My [colleague] was so excited about your GV10x DS Asher that he insisted I had to buy one for my lab."
-Operator, Northwestern University
"...the [GV10x] downstream plasma ashing system shows an obvious improvement compared to the traditional one."
-Lianfeng Fu, et al., Western Digital Corporation
“I wanted to tell you that the GV10x you sent was properly installed, it took me like absolutely no effort to make it work. I tested it with a couple of samples, and the effect was really noticeable.”
-Carlos, Nano Systems Argentina