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The GV10x Downstream Asher reduces hydrocarbon contamination 10X to 20X more effectively and 10X faster than traditional methods. From in-situ electron beam instrument cleaning to hydrogen cleaning to ex-situ sample cleaning and storage, ibss Group offers GV10x options that meet your contamination needs.

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Applications

The GV10x Downstream Asher’s ability to remove carbon contamination is a quantum leap beyond the traditional methods of mitigating contamination using cold trapping, nitrogen purging, and other plasma cleaners. The GV10x, with its extended power and pressure range (5 to 100 Watts and 2 to <0.005 Torr), represents a paradigm shift in the carbon decontamination of SEMs and other vacuum systems.

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Upcoming Events

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  • IPFA 2017 - 24th International Symposium on the Physical and Failure Analysis of Integrated Circuits
    IPFA 2017 - 24th International Symposium on the Physical and Failure Analysis of Integrated Circuits INTERCONTINENTAL CHENGDU GLOBAL CENTER 成都环球中心天堂洲际大饭店 No.1736 Tianfu Avenue North:Chengdu,610041,China 中国四川省成都市高新区天府大道北段1736号
    July 4 - 7, 2017

    IPFA 2017 is organized by the IEEE Reliability / CPMT / ED Singapore Chapter, IEEE Electron Devices Society Chengdu Chapter and the University of Electronic Science and Technology of China ( UESTC ) . The Symposium is technically co-sponsored by the IEEE Electron Device Society and IEEE Reliability Society. IPFA 2017 will be devoted to the fundamental understanding of the physical mechanisms governing failure in a large variety of advanced semiconductor devices and the electrical - physical failure analysis techniques, methodologies and tools that could be use to reliably identify the root cause of failure in these devices.

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  • M&M 2017
    M&M 2017 St. Louis, MO, USA
    August 6-10, 2017

    The Microscopy Society of America (MSA), the Microanalysis Society (MAS), and the International Field Emission Society (IFES) gather at the M&M 2017 Annual Meeting and Exhibition at the America’s Center Convention Complex

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  • SPIE Photomask Technology 2016
    SPIE Photomask Technology 2016 Monterey, California
    September 11-14 2017

    Present and publish at SPIE Photomask Technology + Extreme Ultraviolet Lithography 2017, a technical meeting for mask makers, EUVL, emerging technologies, and the future of mask business.

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  • ISTFA 2017
    ISTFA 2017 Pasadena, CA
    November 5-9 2017

    43rd International Symposium for Testing and Failure Analysis (ISTFA)

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