Downstream Plasma Technology for TEM Report

Downstream Plasma Technology for TEM Report

Downstream Plasma Technology for Cleaning TEM Samples on Carbon Films

Plasma cleaning has become an essential step in modern analytical electron microscopy, which requires contamination-free samples for imaging and elemental analysis. However, the dilemma for carbon film TEM grid users is how to plasma-clean the hydrocarbon contamination while preserving the carbon support film. In order to solve this problem, we have evaluated a new downstream plasma asher system, which uses a gentle and non-kinetic clean mechanism to minimize the side effects of plasma-sample interactions. The results show the system can effectively remove the contamination while preserving the carbon support film.

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