Eric Pellegrin of Cells Alba, a ibss Group, Inc. partner, has been invited to present findings regarding GV10x performance on Synchrotrons at SRI 2018 in Taipei, Taiwan. The Synchrotron Radiation Instrumentation (SRI 2018) will be hosted by the National Synchrotron Radiation Research Center (NSRRC) from June 10 to 15, 2018. A 5-day scientific program will feature the invited […]
Cells Alba speaker at SRI 2018 Read More »
Dear ibss Group Users, For support on ibss products in Japan please contact an authorized representative: Toshiyuki ShamotoElminet [email protected] Thank you for your business. Sincerely, ibss Group, Inc.
ibss Group, Inc. local support in Japan Read More »
An extended study on an advanced method for the cleaning of carbon contaminations from large optical surfaces using a remote inductively coupled low-pressure RF plasma source (GV10x DownStream Asher) is reported. Technical and scientific features of this scaled up cleaning process are analysed, such as the cleaning efficiency for different carbon allotropes (amorphous and diamond-like
Newest Research: Remote Plasma Cleaning of Optical Surfaces Read More »
ibss Group is pleased to announce that its partner, Kammrath & Weiss, will offer GV10x DS Asher Demonstrations in their Dortmund lab. Located in Dortmund, Germany, Kammrath & Weiss has over thirty years’ experience converting customer application requirements into useful products in the EM world. K&W’s developments are brought to life through high precision micro
ibss GV10x Demonstrations at Kammrath & Weiss Read More »
ibss Group is pleased to introduce Scott Shen, its newly appointed bilingual Chinese Liaison. Scott Shen graduated UC Berkeley with a BS and MS in EECS. His employment history includes several Silicon Valley companies including HP, Knights, KLA-Tencor, FEI, Magma and Synopsys. He has been directly involved with several Asian companies as well: TSMC, UMC, Samsung, SMIC. Mr.
Scott Shen: Chinese Liaison Read More »
Downstream Asher for In-Situ Specimen and Specimen Chamber Cleaning presentation, showing before/after cleaning images and adjacent area scans. The ibss GV10x cleaner removed nearly all contamination build-up from the wafer surface after a total clean time of 13 minutes. Additionally: Further cleaning may have completely removed the contamination rectangle It was noted that the line-widths
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