新闻
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Wakefield Accelerator optics reflectivity restored!
UTA has documented that using the GV10x successfully removed HC contamination from 20 and 30-year-old gratings with 69% reflectivity and restored their reflectivity to 88%.
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ACMM – Australia Feb 2020
ibss Group is exhibiting at ACMM in Canberra, Australia – February 2020. We welcome local EM and TEM users to visit ibss booth during ACMM. Please contact to schedule an on-site demo.
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Cells Alba speaker at SRI 2018
Eric Pellegrin of Cells Alba, a ibss Group, Inc. partner, has been invited to present findings regarding GV10x performance on Synchrotrons at SRI 2018 in Taipei, Taiwan. The Synchrotron Radiation Instrumentation (SRI 2018) will be hosted by
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ibss Group, Inc. local support in Japan
Dear ibss Group Users,For support on ibss products in Japan please contact an authorized representative:Toshiyuki ShamotoElminet [email protected] you for your business.Sincerely,ibss Group, Inc.
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Shanghai Business Meeting
On March 18, 2016 ibss Group conducted a sales meeting in Shanghai for its Asian representatives. Chinese companies in attendance were Beijing Python, Beijing United Cosmos, Hong Kong Guangdong, Jun Yi Tech, and Shanghai Risen. Focus Tek of Korea, Inte
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研究
Newest Research: Remote Plasma Cleaning of Optical Surfaces
An extended study on an advanced method for the cleaning of carbon contaminations from large optical surfaces using a remote inductively coupled low-pressure RF plasma source (GV10x DownStream Asher) is reported. Technical and scientific features of th
GV10x Report
Downstream Asher for In-Situ Specimen and Specimen Chamber Cleaning presentation, showing before/after cleaning images and adjacent area scans. The ibss GV10x cleaner removed nearly all contamination build-up from the wafer surface after a total clean
In Situ Plasma Mirror Cleaning Report
Characterization, optimization and surface physics aspects of in situ plasma mirror cleaning Although the graphitic carbon contamination of synchrotron beamline optics has been an obvious problem for several decades, the basic mechanisms underlying the
Downstream Plasma Technology for TEM Report
Downstream Plasma Technology for Cleaning TEM Samples on Carbon Films Plasma cleaning has become an essential step in modern analytical electron microscopy, which requires contamination-free samples for imaging and elemental analysis. However, the dile
