February 23 - 27, 2020
Global Lithography Event, with topics including:
• Extreme Ultraviolet (EUV) Lithography
• Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS
• Metrology, Inspection, and Process Control for Microlithography
• Advances in Patterning Materials and Processes
• Optical Microlithography
• Design-Process-Technology Co-optimization for Manufacturability
• Advanced Etch Technology for Nanopatterning
February 16 - 20, 2020
Our conference theme is “2020 Visions in Microscopy” and at the start of this new decade, this conference will be about bringing together colleagues from life sciences and physical sciences and working together towards new visions and goals in microscopy. We are excited about building a strong program for the conference based on advances in electron and light microscopy and microscopy-enabled research in life sciences and physical sciences.
April 13-17, 2020
Time and time again, "multidisciplinary" research is touted as essential to innovation. That is why, from April 13-17, 2020, researchers working in seemingly unrelated fields will gather in Phoenix, Arizona, to promote, share and discuss issues and developments across disciplines.
The 2020 MRS Spring Meeting & Exhibit is the key forum to present research to an interdisciplinary and international audience. It provides a window on the future of materials science, and offers an opportunity for researchers—from students and postdoctoral fellows, to Nobel and Kavli Prize Laureates—to exchange technical information and network with colleagues.
Aug 2-6, 2020
Mark your calendar and Save the Date for the premier microscopy education and networking event of the year — Microscopy & Microanalysis 2020, August 2-6, in Milwaukee, Wisconsin!
The advent of Artificial Intelligence and the promise of quantum computing are driving disruptive computing architectures. Neuromorphic chip designs on one hand, and Quantum Bits on the other, still in R&D, will introduce new computing circuitry and memory elements, novel materials, and different test methodologies. These novel computing architectures will require further innovation which is best achieved through a collaborative Failure Analysis community composed of chip manufacturers, tool vendors, and universities.
WHO WE ARE:
ASM is Everything Material, the society dedicated to serving the materials science and engineering profession. Through our network of 30,000 members worldwide, ASM provides authoritative information and knowledge on materials and processes, from the structural to the nanoscale.
Over the years, SPIE Advanced Lithography has provided the unique and primary forum for meeting and interacting with a wide range of industry experts, researchers, and key players working on patterning technology development. Attendance ensures that participants learn and share the latest developments in areas of central importance to many vital technology fields and concerns.
International Conference on Synchrotron Radiation Instrumentation (SRI) is a unique, large and the most significant international forum held every three years in the community of synchrotron radiation (SR) and X-ray free electron laser (XFEL). This triennial conference is the prime forum to highlight connections between synchrotron radiation instrumentation, science, and society. It also provides opportunities for discussion and collaborations among scientists and engineers around the world involved in development of new concepts, techniques, and instruments related to synchrotron radiation and free electron laser research.
The Microscopy Society of America (MSA), the Microanalysis Society (MAS), and the Microscopical Society of Canada (MSC) invite you to exhibit at the M&M 2018 Annual Meeting and Exhibition at the Baltimore Convention Center, Baltimore, Maryland, August 5-9, 2018.
Santa Barbara, CA -April 8 2017 -
The SOUTHERN CALIFORNIA SOCIETY FOR MICROSCOPY & MICROANALYSIS is dedicated to increasing interest and information in all areas of microscopy and microanalysis, including, but not limited to: transmission electron, scanning electron and electron microprobe, ion probe, microbeam analysis, optical and confocal microscopies, and microspectroscopies.
The European conference that plays host to the most recent advances in laser technology worldwide. The information is presented by leading researchers, engineers and programme managers covering high-power, high-intensity and high-energy lasers, metamaterials, nonlinear optics, quantum optics, sensors, holography, EUV and X-ray optics, research using extreme light, and much more.
The primary aim of this combined EMAS Workshop / IUMAS Meeting is to assess the state of the art and reliability of microbeam analysis techniques. EMAS was founded in 1987 to meet the growing demands of microanalysis users and scientists across Europe for further education, communication and professional advice. IUMAS was founded in 1994 to promote world-wide cooperation in all aspects of microbeam analysis through the organisation of an international meeting on microbeam analysis every three or four years, and by participating in joint committees with other scientific organisations in matters relevant to microbeam analysis which are better discussed on a world scale.
The Microscience Microscopy Congress is set to be as big and as bold as ever with six parallel conference sessions, an exhibition with more than 100 companies represented, and a brilliant selection of features such as pre-event workshops and turn-up-and-learn training opportunities.
IPFA 2017 is organized by the IEEE Reliability / CPMT / ED Singapore Chapter, IEEE Electron Devices Society Chengdu Chapter and the University of Electronic Science and Technology of China ( UESTC ) . The Symposium is technically co-sponsored by the IEEE Electron Device Society and IEEE Reliability Society. IPFA 2017 will be devoted to the fundamental understanding of the physical mechanisms governing failure in a large variety of advanced semiconductor devices and the electrical - physical failure analysis techniques, methodologies and tools that could be use to reliably identify the root cause of failure in these devices.
The Microscopy Society of America (MSA), the Microanalysis Society (MAS), and the International Field Emission Society (IFES) gather at the M&M 2017 Annual Meeting and Exhibition at the America’s Center Convention Complex
Present and publish at SPIE Photomask Technology + Extreme Ultraviolet Lithography 2017, a technical meeting for mask makers, EUVL, emerging technologies, and the future of mask business.
43rd International Symposium for Testing and Failure Analysis (ISTFA)